We are pleased to announce Extreme Materials and Conditions: Common Ground between Art and Science, an exhibition of the work of Jay Gould from his time as the inaugural Artist in Residence at Hopkins Extreme Materials Institute (HEMI), part of the HEMI/MICA Extreme Arts Program.
Please join the HEMI and MICA communities in celebrating the culmination of Jay’s residency at a reception for his exhibition on April 26th, 4:00 - 7:00 pm, Q Gallery at the Milton S. Eisenhower Library, Johns Hopkins Homewood Campus. An artist talk will be held from 5:30-6 at the April 26th event.
About Jay Gould
Jay Gould, faculty in the Photography Department at MICA, has won numerous national awards such as the Berenice Abbott prize for emerging photographers, the Jennie Pierce Award, and first place at the Newspace Center for Photography’s International Juried Exhibition. Gould's work is widely exhibited around the country, making solo and group exhibition appearances at the Fridman Gallery in NYC, the University of Notre Dame, The Julia Dean Gallery in Los Angeles, the Fort Collins Museum of Contemporary Art, the Urban Institute for Contemporary Arts in Grand Rapids, Michigan, the Griffin Museum of Photography, the Center for Maine Contemporary Art, and the John Michael Kohler Arts Center. Jay received his BFA from the University of Wisconsin (2004) and MFA from Savannah College of Art and Design (2006).
About the Extreme Arts Program
The Extreme Arts Program is an opportunity for MICA faculty and students to work with engineers and scientists at the Hopkins Extreme Materials Institute (HEMI). The program aims to encourage collaboration among artists and researchers to examine data, interpret outcomes, and translate results from extreme events in new ways.
For a full description of the program’s goal please visit this website.
Friday, May 19
Milton S. Eisenhower Library, Q Level Johns Hopkins University (Homewood Campus) 3400 N. Charles St. Baltimore, MD 21218